COMPANY PROFILE

ASTECH Corp was founded here in Tokyo, Japan by Mr. Mitsuyuki Umino, President, chairman and Chief Executive Officer on 8th September 1972 under the control of Japanese law in order to act as an exclusive sales and service representative mainly for electronic or scientific instrument manufacturers in the United States of America, so that over 27 years have been passed so far with keeping on a fairly nice business growth and capitalization. ASTECH Corp. therefore is not a public company yet at this time.

In 1986 ASTECH Corp. started to build and sell it's own products, i.e., Model LG Series All Solid-state Broadband Plasma Generators, 50KHz to 2MHz frequency coverage and 0 to 5KW output power as well as Model T Series Impedance Auto Matching Networks specifically for plasma enhanced chemical vapor deposition (PECVD) or plasma dry etching process in semiconductor fabrication after our extensive research and development works and at present we are proud to say that ASTECH Corp. is only one specialized supplier for those unique products in the world, still continuing a stride of diversification of new high speed and microprocessor-controlled matching network products. In 1992 ASTECH Corp. began to sell it's matching network products in the United States of America through RF Power Products, Inc. on an OEM basis for Applied Materials Inc., Materials Research Corp., Plasma-Therm Inc., Johnson Controls Corp. and etc.

In 1982 our branch sales and service office was opened in the city of Osaka to fully cover the western part of Japan islands, wherein 10 people are now working hard.

     445.53㎡ for Osaka Branch Office